Fraunhofer Institute for Silicon Technology

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Fraunhofer Institute for Silicon Technology

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Fraunhofer Institute for Silicon Technology, Research institute in Itzehoe, Germany.

The Fraunhofer Institute for Silicon Technology operates modern clean room facilities dedicated to microelectronics and microsystems technology development and manufacturing processes.

Established in 1999, the institute emerged as an integral part of the Fraunhofer Society to advance silicon-based technologies and industrial applications in northern Germany.

The institute maintains strong connections with academic institutions and industry partners, facilitating knowledge exchange through specialized programs, workshops, and research collaborations.

Scientists at the facility develop power electronics components and microsystems for applications in medicine, environmental engineering, communication technology, and automotive industries.

The institute houses manufacturing capabilities that enable direct industrial-scale production of microchips, bridging the gap between research and commercial implementation.

Location: Itzehoe

Inception: 1999

Part of: Fraunhofer Society

Website: http://isit.fraunhofer.de

GPS coordinates: 53.95720,9.48278

Latest update: March 3, 2025 15:22

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